Principle of vacuum coating machine

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I want to know the principle of vacuum coating machine

I. operation of electric control cabinet
1
boiling water pump and air source
2
turn on the total power supply
3
turn on the power supply of the maintenance pump and vacuum gauge, and the vacuum gauge gear position is V1. Wait until its value is less than 10, and then enter the next operation. It takes about 5 minutes
4.
it takes about 20 minutes to turn on the mechanical pump and pre pumping, turn on the power supply of the turbomolecular pump and start it, and change the vacuum gauge switch to V2 position until the pumping is less than 2
5.
after the reading of turbomolecular pump reaches 250, turn off the pumping, turn on the front unit and high valve to continue vacuumizing, and turn on the high vacuum meter on the right to observe the vacuum degree after the vacuumizing reaches a certain degree. Vacuum reaches 2 × The power supply of the electron gun can only be turned on after 10-3
II. Operation of def-6b electron gun power cabinet
1
total power supply
2
turn on the power supply of electron gun control I and electron gun control II at the same time: press the electron gun control I power supply and delay switch, the delay, power supply and protection light will be on, and the delay and protection light will be off after three minutes. If the rear door is not closed or the water flow relay is faulty, the protection light will be on constantly
3.
when the high voltage is turned on, the high voltage will reach more than 10kV, the beam current can be adjusted to about 200mA, the curtain grid is 20V /100mA, the filament current is 1.2A, and the deflection current swings between 1 ~ 1.7
III. shutdown sequence
1
turn off the high vacuum meter and molecular pump
2.
when the molecular pump displays 50, turn off the high valve, front stage and mechanical pump in turn, which takes about 40 minutes
3.
when it is below 50, turn off the maintenance pump.

it’s a long story. To be simple, the electrons excited by the cathode collide with argon atoms in the process of accelerating flying to the substrate under the action of electric field, ionizing a large number of argon ions and secondary electrons, and the secondary electrons fly to the substrate. Under the action of electric field, argon ion accelerates the bombardment of the target, splashes a large number of target atoms, and neutral target atoms (or molecules) are deposited on the substrate to form a thin film. In the process of accelerating to the substrate, the secondary electron is affected by the magnetic field and Loren magnetic force, and is bound in the plasma region close to the target surface. The plasma density in this region is very high. The secondary electron makes a circular motion around the target surface under the action of the magnetic field, and the motion path of the electron is very long, In the process of movement, it constantly collides with argon atoms and ionizes a large number of argon ions to bombard the target. After multiple collisions, the energy of secondary electrons gradually decreases, gets rid of the shackles of magnetic lines of force and is far away from the target,
and finally deposits on the substrate

your problem is too big

simply put the film material on the substrate. This includes sputtering and shooting with an electron gun. Different coating machines are different
the purpose of vacuum is to make the average free path of molecules larger, that is, to prevent membrane molecules from touching air molecules.

argon ions are mainly impacted on the surface of the target by glow discharge, and the atoms of the target are ejected and stacked on the surface of the substrate to form a thin film
the following solid substances can be targets: Any normal temperature solid metal (copper, aluminum, titanium) Solid nonmetal (graphite, silicon oxide (SiO2) Alloy stainless steel (SUS) Metal oxides (titanium oxide, indium oxide)
note:
generally, direct current (DC) sputtering is used for metal coating, while RF AC is used for non-conductive ceramic materials

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